Absolute Depth Filter
- Company Name:ePore Co., Ltd.
- Membership:Free Member
- Member Since:2008. 03.21
- Country/Region:Korea
- City:Gyeonggi-do
- Contact:HS Shim
- Related Keywords:Absolute Depth Filter, Liquid Filtering, Purifying, Cartridge
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ePore Co., Ltd.
[Korea]
Description
CMP(Chemical Mechanical Polishing)filter cartridges is constructed of polypropylene filter media to ensure high efficiency by layering filter media inside of the filter. CMP filter is used for the filtration of both oxide and metal slurry at chemical mechanical polishing process.
This multi-layer depth structure provides high dirt holding capacity.
Available in a wide absolute filter removal ratings from 0.5㎛ to 40㎛
Application
Specification
Material of Construction
Recommended Operating Conditions
Removal Ratings(㎛)
Cartridge Dimensions
Removal Efficiency
Ordering Information
| Special Option | ||||||
| lxtus |
|
01:1.0㎛ 03:3.0㎛ 05:5.0㎛ 07 : 0.7㎛ 10:10.0㎛ 20:20.0㎛ 40:40.0㎛ |
'B':254mm D/O 'C':2-222 O-ring / Flat ent 'D':2-226 O-ring / Flat end 'E':2-222 O-ring / Fin end 'F':2-226 O-ring / Fin end |
'1':10" '2':20" '3':30" '4':40" |
N:Buna-N S:Silicone V:Viton T:Teflon encapsulated Viton | V : Vacuum Packaging S : SUS ring Insertion |
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