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Description
CMP(Chemical Mechanical Polishing)filter cartridges is constructed of polypropylene filter media to ensure high efficiency the inner multi-layer. CMP filter are used for the filtration of both oxide and metal slurries at chemical mechanical polishing process.
- This multi-layer depth structure provides high dirt holding capacity.
- Available in a wide absolute filter removal ratings from 0.5㎛ to 40㎛
Application
- Oxide slurry, Metal slurry, Chemical slurry, Pigment.
Specification
Material of Construction
- Media : Polypropylene microfiber 100%
- Core/cage : Polypropylene
- Sealing : Thermal bonding
Recommended Operating Conditions
- Maximum Differential Pressure : 70psi(4.8bar) at 25
Removal Ratings(㎛)
- 0.5, 0.3, 0.5, 0.7, 1, 10, 20, 40
Cartridge Dimensions
- In diameter : 30mm
- Out diameter : 65mm
Removal Efficiency
Ordering Information
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①
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②
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③ ④
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⑤
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⑥
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⑦
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⑧
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Brand
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Type
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Micron Ration
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End - Cap Option
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Length
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O-ring Material
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Special Option |
'IX'
lxtus
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'A' : Absolute Depth
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D5 : 0.5㎛,
01:1.0㎛
03:3.0㎛
05:5.0㎛
07 : 0.7㎛
10:10.0㎛
20:20.0㎛
40:40.0㎛
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'A':250mm D/O
'B':254mm D/O
'C':2-222 O-ring / Flat ent
'D':2-226 O-ring / Flat end
'E':2-222 O-ring / Fin end
'F':2-226 O-ring / Fin end
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'5':5"
'1':10"
'2':20"
'3':30"
'4':40"
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E:EPDM
N:Buna-N
S:Silicone
V:Viton
T:Teflon encapsulated Viton
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C : DI cleaning&Vacuum package
V : Vacuum Packaging
S : SUS ring Insertion
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